| abstract |
The invention provides an electron beam apparatus, comprising: an e-beam source configured to generate an electron beam; a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object ntable relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer; a second part configured to movably support the first part; and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate. |