http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I719160-B

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5f7f120efe096284c7389702c969cf3d
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30655
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
filingDate 2017-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f5f4c353e9448cb66e627017e92500ff
publicationDate 2021-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I719160-B
titleOfInvention Plasma etching method
abstract The plasma etching method of the present invention includes a deposition step of forming a thin film by making the inside of the processing container into a gas environment containing a first processing gas and a second processing gas, the first processing gas containing fluorine atoms and/or carbon atoms The second processing gas system has a rare gas as the main component; and the etching step, which makes the processing container into a gas environment containing at least the second processing gas, and plasma etching is performed on the substrate to be processed; The deposition step and the etching step are alternately implemented, and the deposition step includes: when the gas environment in the processing container contains the first and second processing gases, the gas environment contains carbon atoms on a mass basis. 2.4 times to 3.1 times the fluorine atom.
priorityDate 2016-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID53395686
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID69654
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419519694
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5708673
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419600819
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419569951
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID19961389
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415743364
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID498797
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9998
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419527022
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID416025980
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419517548
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419546761
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID12767
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419607534
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID588820
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457280508
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556964
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID17358
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID456171974
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414871580
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6431
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11769384
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415979636
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6345
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5416
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426091732
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419546198
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6373
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID420228615
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8263
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID69636
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419813054
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11212
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414867697

Total number of triples: 52.