| abstract |
The subject of the present invention is to provide a treatment solution that has corrosion resistance to metal films arranged on a substrate, and removability of organic films on the substrate, or to dry etching residues and dry ashing attached to the substrate. The removability of residues is excellent. The treatment liquid of the present invention contains water, a hydrophilic organic solvent, a quaternary ammonium salt, and an inorganic anion, and the content of the inorganic anion is 0.001 mass ppt-1 mass ppm relative to the total mass of the treatment liquid. |