| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_421cadb30fc0074fe61126eb980d19d6 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-002 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32724
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67248
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0206
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
| filingDate |
2019-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2020-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fba4aacc5ae858284c6319174007ef02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f8d0bf8fd842c6fee698a0c1ede3353
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_854f7d2c411dbf6917412ecbb7a95e99
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d6a1bae90404c9b41999b1a50a1054f7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a8adbe360c0d40b0898258379e5fa32b |
| publicationDate |
2020-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I706461-B |
| titleOfInvention |
Plasma processing device and processing method of processed sample using it |
| abstract |
In the case where radicals are adsorbed on the surface of the etched layer to form a reaction layer and removed, in order to prevent the surface other than the etched layer from being caused by the free radicals deposited on the surface of the etched layer Roughening occurs and the reaction layer is removed. In a method of processing a membrane structure, the aforementioned membrane structure is composed of a lower layer of film pre-arranged on the sample to be processed and a layer of the upper layer of the treatment target film arranged above it. The membrane structure is processed by the following procedure: an adsorption procedure, which is to supply activated particles to the inside of the processing chamber to adsorb the activated particles on the surface of the upper membrane and combine with the material of the upper membrane to form a reaction product Substance layer; removal procedure, which is to remove the particles attached to the surface of the underlying film including the activated particles supplied to the inside of the processing chamber using the plasma formed by supplying oxygen to the processing chamber者; and the separation process, which is to heat the processed sample that has undergone the adsorption process and the removal process to release and remove the reaction product layer of the upper film. |
| priorityDate |
2018-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |