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filingDate 2018-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2020-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I694518-B
titleOfInvention Substrate processing device, quartz reaction tube, cleaning method and recording medium
abstract Disclosed is a substrate processing apparatus using a double tube reactor having improved exhaust performance. The reactor tube has an exhaust port communicating with an exhaust space between the outer tube and the inner tube, a first exhaust opening (4E) provided in the inner tube for discharging the process gas, second exhaust openings (4H, 4J) allowing fluid communication between a space inside the exhaust space and a manifold, and third exhaust openings (4G) passing through the inner pipe at a location facing the heat insulating assembly. The second exhaust openings accelerates exhaust of the gas staying far from the first exhaust opening in the exhaust space.
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