| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-2001 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32724
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32522
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2015-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2019-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d234124be7e513dda348c4f8808368e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb891c12641bd590241f730b01b01a41
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_95158a0dceb2929231588aef058daf81
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60b9a98b8fdbd0ffab398cc3db0fbfbe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8073fab7bc6a8a78b49e72b9a6f881fd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cbc75ce096897ec9375b9b35586975a7 |
| publicationDate |
2019-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I670783-B |
| titleOfInvention |
Method and system for improving process uniformity |
| abstract |
The semiconductor processing chamber may include a remote plasma region and a processing region fluidly coupled to the remote plasma region. The processing area may be configured to accommodate the substrate on the support base. The support base may contain the first material at the inner region of the base. The support base may also include an annular member coupled to the distal portion of the base or at an outer region of the base. The ring member may contain a second material different from the first material. |
| priorityDate |
2014-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |