http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I670768-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5f7f120efe096284c7389702c969cf3d |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C43-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate | 2015-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e44ad61cacbd1d8da2064aba42fe984b |
| publicationDate | 2019-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I670768-B |
| titleOfInvention | Plasma etching method |
| abstract | The invention is a plasma etching method, which is a plasma etching method using a processing gas under plasma conditions, and is characterized by using at least one selected from the hydrofluoroethers represented by formula (I) as a processing gas. In formula (1), R represents a hydrogen atom or a fluoroalkyl group represented by C n F 2n + 1 ; m and n represent integers satisfying 1 ≦ m ≦ 3 and 3 ≦ (m + n) ≦ 4. According to the present invention, a plasma etching method can be provided, which is based on the etching of silicon oxides. Even without oxygen or hydrogen, a sufficiently high etching rate can be achieved while achieving the same performance as silicon nitride or silicon or organic materials. High etch selectivity.n n n C m F 2m + 1 -O-CH 2 -R (I) |
| priorityDate | 2014-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 55.