Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_129e393582e6bdf4029baf2206522f45 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F21Y2115-10 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-1464 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14643 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14621 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14609 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2012 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14685 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-223 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-146 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H04N5-374 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-32 |
filingDate |
2015-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2019-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_19d7e94a374305a08525324a84901162 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1cc1e6fab6f2de8e9a0bfe4acc9db48b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d4d47da18fd2a25fc78651b45ddb7e1c |
publicationDate |
2019-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-I666511-B |
titleOfInvention |
Negative photosensitive resin composition, cured film formed by the same, method for producing the same, optical element including the same, and image sensor |
abstract |
The subject of the present invention is to develop a negative photosensitive resin composition that can obtain a rectangular cross-section pattern suitable for pixel formation and partition wall formation. The rectangular cross-section pattern has a high refractive index and has no additional post-exposure process. High transparency characteristics, high sensitivity during exposure, excellent resolution and solvent resistance after pattern formation. This problem can be solved by a negative photosensitive composition containing the following (a) to (d):nn n n (a) Metal compound particlesnn n n (b) Polysiloxane compoundnn n n (c) Compounds having one or more groups containing an α, β-unsaturated carboxylic acid ester structurenn n n (d) A photopolymerization initiator, further comprising (e) a compound having a maleimide group. |
priorityDate |
2014-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |