http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I665330-B
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a4db52ef59dff9aea9fa75efcfbe0a7b |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-513 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-12 |
filingDate | 2018-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2019-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5f3ddba334ddfc769c97e7064e2582e |
publicationDate | 2019-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-I665330-B |
titleOfInvention | Method for plating scratch-resistant hydrophobic layer on metal surface |
abstract | A plating method for a scratch-resistant hydrophobic layer, the steps include: plasma surface pretreatment: a metal surface is subjected to plasma pretreatment; the plasma used in the pretreatment is hydrogen ≧ 0.1 sccm, plasma discharge Frequency ≧ 100 kHz, power ≧ 10 watts, and the metal surface temperature ≦ 180 o C, and may further include argon gas> 0 sccm; and anti-scratch hydrophobic layer deposition: pre-plasma the metal surface to The scratch-resistant hydrophobic layer is deposited on the surface of the metal in the form of a slurry. The thickness of the scratch-resistant hydrophobic layer is preferably ≧ 100 nm. The plasma used for the deposition is argon and / or nitrogen ≧ 0 sccm, carbon-containing silicon oxide steam ≧ 0.1 sccm, a plasma discharge frequency ≧ 100 kHz, the power ≧ 10 watts (w) and the temperature of the surface of the metal M ≦ 180 o C for. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113390305-A |
priorityDate | 2018-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 38.