http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I665330-B

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a4db52ef59dff9aea9fa75efcfbe0a7b
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-513
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-12
filingDate 2018-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2019-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5f3ddba334ddfc769c97e7064e2582e
publicationDate 2019-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I665330-B
titleOfInvention Method for plating scratch-resistant hydrophobic layer on metal surface
abstract A plating method for a scratch-resistant hydrophobic layer, the steps include: plasma surface pretreatment: a metal surface is subjected to plasma pretreatment; the plasma used in the pretreatment is hydrogen ≧ 0.1 sccm, plasma discharge Frequency ≧ 100 kHz, power ≧ 10 watts, and the metal surface temperature ≦ 180 o C, and may further include argon gas> 0 sccm; and anti-scratch hydrophobic layer deposition: pre-plasma the metal surface to The scratch-resistant hydrophobic layer is deposited on the surface of the metal in the form of a slurry. The thickness of the scratch-resistant hydrophobic layer is preferably ≧ 100 nm. The plasma used for the deposition is argon and / or nitrogen ≧ 0 sccm, carbon-containing silicon oxide steam ≧ 0.1 sccm, a plasma discharge frequency ≧ 100 kHz, the power ≧ 10 watts (w) and the temperature of the surface of the metal M ≦ 180 o C for.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113390305-A
priorityDate 2018-06-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201819665-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID297
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID20111961
http://rdf.ncbi.nlm.nih.gov/pubchem/taxonomy/TAXID182111
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID18618944
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419501450
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID447138
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359268
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559581
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458357694
http://rdf.ncbi.nlm.nih.gov/pubchem/anatomy/ANATOMYID182111
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23968
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID452170571
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID452580220
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419491804
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458392451

Total number of triples: 38.