http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I660420-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate | 2014-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d84c0db61590d9d629ac9a0c4808aafc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d234124be7e513dda348c4f8808368e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5279bc0ae1450de664f316da3f097499 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94879ef4d212a86d39c2a2c1e747f063 |
| publicationDate | 2019-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I660420-B |
| titleOfInvention | Enhanced etching process using a remote plasma source |
| abstract | The method of etching a patterned substrate may include flowing an oxygen-containing precursor into a first distal plasma region fluidly coupled to the substrate processing region. An oxygen-containing precursor can be flowed into the region while plasma is formed in the first remote plasma region to generate an oxygen-containing plasma effluent. The method may further include flowing a fluorine-containing precursor into a second remote plasma region fluidly coupled to the substrate processing region, and simultaneously forming a plasma in the second remote plasma region to generate a fluorine-containing plasma outflow Thing. The method may include flowing the oxygen-containing plasma effluent and fluorine-containing plasma effluent into the processing region, and using the effluent to etch a patterned substrate located in the substrate processing region. |
| priorityDate | 2013-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 57.