| abstract |
Describe Si-X and Ge-X compounds (X = N, P, As, and Sb) prepared by dehydrogenation coupling between corresponding unsubstituted silanes and amines (including ammonia) or phosphines catalyzed by metal catalysts, and Its preparation method. This novel method is based on the catalytic dehydrogenation coupling of Si-H and X-H moieties to form Si-X-containing compounds and hydrogen (X = N, P, As, and Sb). This method can be catalyzed by transition metal heterogeneous catalysts such as Ru (0) / carbon, Pd (0) / MgO, and transition metal organometallic complexes serving as homogeneous catalysts. The -Si-X product produced by the dehydrogenation coupling is itself halogen-free. These compounds are suitable for depositing thin films by chemical vapor deposition or atomic layer deposition of Si-containing films. |