| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 |
| filingDate |
2014-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_437d14690895e9f410586b0516cdee8c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_531383e3f947d81639d3f284d5acb2bb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96056afea4ebb9762bfa12db4af32e72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_770fbc538cb3449ffa1add4e048d7aa5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea25ddcb75c20bd95bc600b695208bc5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f58822eeb798b64661ca705e323e6d4a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bbe6d4aeb68a518f0a7ef29b2a21c920 |
| publicationDate |
2018-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I643971-B |
| titleOfInvention |
Thin film deposition using space atomic layer deposition or pulsed chemical vapor deposition |
| abstract |
The present disclosure provides an atomic layer deposition method for depositing a film using a circular batch processing chamber having a plurality of sections separated by an air curtain such that each section independently has a process condition. |
| priorityDate |
2014-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |