| abstract |
The invention provides a resin composition for forming an underlayer film, a laminated body, a pattern forming method, an imprint forming sleeve, and a method for manufacturing a component having a small thickness of a residual film after die pressing and a line width distribution that is unlikely to vary after processing. . A resin composition for forming an underlayer film, which is applied to a substrate to form an underlayer film, and includes a first resin having a radical reactive group in a side chain, and a second resin having at least one of a fluorine atom and a silicon atom. Resin, and solvent. The second resin is preferably a resin containing a fluorine atom. The radically reactive group of the first resin is preferably a (meth) acrylfluorenyl group. |