| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_421cadb30fc0074fe61126eb980d19d6 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02315
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66795
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32137
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-308
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32132
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-785 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2016-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2018-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f67da1d1acda15c869b1c557111f9374
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1203c0b545ec3d1226ed03cf831636ab |
| publicationDate |
2018-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I630655-B |
| titleOfInvention |
Dry etching method |
| abstract |
The present invention provides a dry etching method that maintains a mask selection while being plasma-etched into a vertical shape.nn n n The present invention is a dry etching method which is a dry etching method which maintains a mask selection while being plasma-etched into a vertical shape, and is characterized in that it has a first process which is to be etched by using a reactive gas. Etching, the etching shape of the film to be etched is a skirt shape, and the second process is to form the skirt shape into a vertical shape by sputtering etching after the first process. |
| priorityDate |
2015-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |