http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I617889-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-14 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-1804 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-18 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate | 2013-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2018-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d59fc16c05232a51ae619b9c701f003 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd03b5b01b16cf2971ad313104c5cc6d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97443f8ad106af852b084bfe4d89daf3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7f1e1ca982410245602a295d24aa0ed http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c6dedb2bfd6b34c51908678e6ad554b2 |
| publicationDate | 2018-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I617889-B |
| titleOfInvention | Anti-corrosion underlayer film forming composition containing ruthenium having a cyclic diester group |
| abstract | An object of the present invention is to provide a resist underlayer film which can be used as a hard mask.nn n n The solution of the present invention is a composition for forming a lithography underlayer film comprising hydrolyzable decane, a hydrolyzate thereof, or a hydrolysis condensate thereof as a decane, the hydrolyzable decane comprising the formula (1) a hydrolyzable decane composed of decane or a combination of a decane represented by the formula (1) and a decane represented by the formula (2), and a hydrolysis of a combination of the formula (1) or the formula (1) and the formula (2) The sex decane system is contained in less than 50 mole % in the total decane.nn n n Formula 1):nn n n R 1 a R 2 b Si(R 3 ) 4-(a+b) Formula (1) wherein R 1 is a formula (1-1), a formula (1-2), or a formula ( 1-3) The organic group, a represents an integer of 1, b represents an integer of 0 or 1, and a+b represents an integer of 1 or 2. 〕n n n n n n n n n n Equation (2):nn n n R 3 a R 5 b Si(R 6 ) 4-(a+b) Formula (2) wherein R 4 contains Formula (2-1), Formula (2-2), or Formula (2) An organic group of -3), a represents an integer of 1, b represents an integer of 0 or 1, and a+b represents an integer of 1 or 2. 〕 |
| priorityDate | 2012-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 778.