| abstract |
An object of the present invention is to improve the controllability, film quality, and the like of the composition of a nitride film formed on a substrate.nn n n The present invention has the following steps: a first raw material and a first nitriding agent are supplied to a substrate having an oxygen-containing film formed on the surface thereof, and an initial film is formed on the oxygen-containing film; The film is modified to a first nitride film; and a second raw material and a second nitride agent are supplied to the substrate, and a second nitride film is formed on the first nitride film. |