| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1eb9cd2af2f87dcf20b0fbbdfe79996e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30655
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2010-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2016-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0129e1471d590343e5188089032597c1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca2786cd7c76aaf4c4a48595a9ca1842
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5dd1fa84def2fdb362391ae09b84fabc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1a755db09ad3dfb66ebaefddd9f3747
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7eb63849aeb6f04608ad8884cc8a6f4a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96643b7d34ecbaad6fce64e62332c53d |
| publicationDate |
2016-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I518773-B |
| titleOfInvention |
Enhanced passivation process for protecting bismuth prior to high-dose implant stripping |
| priorityDate |
2009-12-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |