| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_985f1bf0df4204078e687f8417dc5871 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32633
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32596
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-452
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-36 |
| filingDate |
2009-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2014-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f597b11b742994bc5b5385814e2820b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9325c30ecf00a11a3123271d136e101c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f6d4a65cf69104da1e59355fbffaccd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_165bbd64b3242bdf968327218f2892cd |
| publicationDate |
2014-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I427669-B |
| titleOfInvention |
Device for processing large-area substrates using hollow cathode plasma |
| priorityDate |
2008-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |