| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_063a1b324005ddc15e16e7529c6258c4 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 |
| filingDate |
2006-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2013-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3d4e9610add36e0331d33f7a2950e27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aaf49bab2d49382285606823c620230c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9d633ccaf5c468b2aa645ed14057b11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c6a5ed949ad161a79895242b9b4e109
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8978cec7fc8f4102db95be64b4ec9a57
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12f03770662be4f3c234d3405a2df40e |
| publicationDate |
2013-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I409873-B |
| titleOfInvention |
Plasma processing device |
| abstract |
The plasma processing apparatus has a beam-shaped spacer 7 placed at the upper opening of the chamber 3 opposed to the substrate 2. The beam-shaped spacer 7 has an annular outer peripheral portion 7a whose lower surface 7d is supported by the chamber 3, a central portion 7b located at the center of a region surrounded by the outer peripheral portion 7a in plane view, and a plurality of beam portions 7c extending radially from the central portion 7b to the outer peripheral portion 7a. An entire of a dielectric plate 8 is uniformly supported by the beam-shaped spacer 7. The dielectric plate 8 can be reduces in thickness while securing a mechanical strength for supporting the atmospheric pressure when the chamber 3 is internally reduced in pressure. |
| priorityDate |
2005-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |