Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate |
2007-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2013-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_62e2892b2a05b9e1f66c57d72e144851 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef495b5e6cf854901df6f4311a1deac0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79a4c297fe26465f427b7bf18a643a56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ab9fd0e67049447b5c4db1f50f5e898 |
publicationDate |
2013-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-I396050-B |
titleOfInvention |
Positive-type photoresist composition and pattern forming method using the same-type photoresist composition |
priorityDate |
2006-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |