abstract |
PROBLEM TO BE SOLVED: To provide a polymer useful as a constituent resin such as a resist, a method for producing the same, a DUV excimer laser lithography, etc., high sensitivity, high resolution, little generation of microgel, and line edge roughness. The present invention provides an excellent resist composition having a small size and a pattern forming method using the resist composition. The (co) polymer of the present invention comprises a structural unit represented by the following formula (1): A resist pattern is formed using a resist composition containing the resist polymer. [Selection figure] None |