| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68742
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67253
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-68785
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3255 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2007-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2012-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6044a2cc73f553239f523e6a3cf50541
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2deef4612dfcf1d3b0a52a664496e125
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7552de653a73f7869dbf84c9976f8c5b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac79c229a332ed9dba8cac9041d70d0e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31d42e62a0c122bf9152f9dd56c17e33
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d73fddeb26fc0eb13bbd594190fec5ec |
| publicationDate |
2012-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-I375990-B |
| titleOfInvention |
Mask etch plasma reactor with cathode providing a uniform distribution of etch rate |
| priorityDate |
2006-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |