http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I236710-B

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0950e9df7f0e1b73efee1bda859951ad
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3342
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32431
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-314
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
filingDate 2003-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2005-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d719ae81df84a3695a8e1a6bb255473
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a812a2e19bd83ba721ca48c41680625
publicationDate 2005-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-I236710-B
titleOfInvention Plasma processing device, plasma processing method and semiconductor manufacturing device
abstract The plasma processing device of the present invention comprises: a container to receive the processed substrate; an inlet opening to introduce hydrogen-containing gas into the container; a lower electrode to load the processed substrate in the container; an upper electrode to generate plasma in the container, and opposed to the lower electrode; a power source to apply voltage between the lower electrode and the upper electrode; and a metal oxide structure disposed in one portion of the container. The metal oxide structure is reduced when the hydrogen-containing gas is introduced.
priorityDate 2002-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425193155
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458392451
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID783

Total number of triples: 20.