http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I230415-B
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1cdd7f1bcb1ef27b40b999ab17671911 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32541 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate | 2003-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2005-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ec333be6f392bb40c91c6dfb7c2fc7f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1714a923920481c7975cf28b5405791f |
| publicationDate | 2005-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-I230415-B |
| titleOfInvention | Electrode for dry etching a semiconductor wafer |
| abstract | Disclosed is an electrode for dry etching a semiconductor wafer. The electrode includes a first electrode and a second electrode. The first electrode includes a first flat plate and a ring-shaped first protrusion corresponding to one surface of the edge of a wafer, and the second electrode includes a second flat plate and a ring-shaped second protrusion corresponding to the other surface of the edge of the wafer. The first flat plate and the second flat plate are the same dimension, and the first protrusion and the second protrusion are the same dimension. |
| priorityDate | 2002-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 23.