| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_421cadb30fc0074fe61126eb980d19d6 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05B2219-45212 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32137
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67253 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2002-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2003-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_240b7c4768ce8d51eec6168a58ef3562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e2d21e0c557d8d24f922dc2173e6b6e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0665afcc2554365faf1a364c16f5c901
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ccf51652faaa9fff01a4bc08da55e140
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5f92c6479b96e9f3778f94fdce64a0b |
| publicationDate |
2003-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-567555-B |
| titleOfInvention |
Etching system and etching method |
| abstract |
The object of the present invention is to provide an etching method which can alleviate the fear of unexpected side effects, particularly when a feedback control is performed, and can build up a control model without using enormous labor and time. According to the present invention, there is provided an etching system for subjecting a single film to be etched to etching comprised of a plurality of etching steps applying respective different recipes, in which the etching system comprises a recipe generating means which fixes a recipe to be applied to the last etching step (step 5) affecting an underlying film making contact with the film to be etched, of the etching steps, to a preset recipe and which generates recipes to be applied to the residual etching step (step 4) on the basis of processed results, and the etching is conducted according to the recipes generated by the recipe generating means. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112133631-A |
| priorityDate |
2002-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |