Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25F3-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23H5-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D17-005 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D17-00 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B23H5-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25F7-00 |
filingDate |
2002-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2003-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b23fd7a7860a7797279de6e0e4a96d3a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3eed43673a420c9170a9ae3625deae8c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3812b701d883ae8a20d95d110caf0394 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_259dd58266d7a94a55907e2d7970acc3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b8b103cba30fd7e7bc8857e4fc7d576 |
publicationDate |
2003-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-536450-B |
titleOfInvention |
Conductive polishing article for electrochemical mechanical polishing |
abstract |
An article of manufacture and apparatus are provided for planarizing a substrate surface. In one aspect, an article of manufacture is provided for polishing a substrate including polishing article comprising a body having at least a partially conductive surface adapted to polish the substrate and a mounting surface. A plurality of perforations may be formed in the polishing article for flow of material therethrough. In another aspect, a polishing article for polishing a substrate includes a body having a polishing surface and a conductive element disposed therein. The conductive element may have a contact surface that extends beyond a plane defined by the polishing surface. The polishing surface may have one or more pockets formed therein. The conductive element may be disposed in each of the polishing pockets. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7655565-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7709382-B2 |
priorityDate |
2001-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |