http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-536450-B

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filingDate 2002-04-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2003-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b23fd7a7860a7797279de6e0e4a96d3a
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publicationDate 2003-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-536450-B
titleOfInvention Conductive polishing article for electrochemical mechanical polishing
abstract An article of manufacture and apparatus are provided for planarizing a substrate surface. In one aspect, an article of manufacture is provided for polishing a substrate including polishing article comprising a body having at least a partially conductive surface adapted to polish the substrate and a mounting surface. A plurality of perforations may be formed in the polishing article for flow of material therethrough. In another aspect, a polishing article for polishing a substrate includes a body having a polishing surface and a conductive element disposed therein. The conductive element may have a contact surface that extends beyond a plane defined by the polishing surface. The polishing surface may have one or more pockets formed therein. The conductive element may be disposed in each of the polishing pockets.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7655565-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7709382-B2
priorityDate 2001-04-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 34.