| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2015-0693 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N15-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67253 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N15-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 |
| filingDate |
2000-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2003-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8dfe6765ebc5d8af17a4a44547302686
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e76fc8b89c9a573f36ac96a8ef058802
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_38bf331be681cd171cb40791d5e3c9e2 |
| publicationDate |
2003-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-518671-B |
| titleOfInvention |
Particle-measuring system and particle-measuring method |
| abstract |
The present invention provides a particle-measuring system and the particle measuring method that is provided in a processing system for generating an atmosphere including atmospheric air or a gas exhausted from within a processing chamber by a vacuum pump, and for processing a wafer W relating to a semiconductor manufacturing in this atmosphere, and that is installed on an exhaust pipe connecting between an exhaust opening of the processing chamber and the vacuum pump, for measuring the number of particles included in the exhaust gas. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11112345-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I500917-B |
| priorityDate |
1999-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |