| abstract |
The holding apparatus for object to be processed according to this invention includes a projected shape holder body that is formed with a holding portion for holding the processed object, and a flange that is inserted into a focus ring and that is disposed along the outer periphery of the holding portion; a first conductive film for attracting the processed object, which is disposed on the holding portion, to the holder body by virtue of a Coulomb force; and a second conductive film for attracting the focus ring, which is disposed on the flange, to the holder body by virtue of a Johnson-Rahbeck force that is stronger than the Coulomb force. Accordingly, the static attractive force of the focus ring toward the holder body is increased, and the cooling effect is enhanced so as to avoid changes taking place usually near the focus ring with respect to plasma-processing characteristics, thereby processing the whole processed object uniformly. |