| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f481982f9992cbb527a6d31589832958 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 |
| filingDate |
1999-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2001-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a826687a63e48bc0f1cc95684a8877e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f32a68a31ee83dc63b323bdfd0d36c4a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52f4da7d1a75b5c20de084d050a6d1ac
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a43b6d31988ccdd57711947714ca6907 |
| publicationDate |
2001-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-449825-B |
| titleOfInvention |
Integrated circuit fabrication |
| abstract |
The quartz shadow ring (e.g., 131) of a conventional plasma etching apparatus is desirably coated with material which inhibits the liberation of oxygen into the plasma. Investigation has shown that the liberated oxygen degrades etching uniformity across the wafer. |
| priorityDate |
1998-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |