http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202143359-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4fe6aaea44d7b3cb0ace2b6c69a1c383
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32522
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32431
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
filingDate 2020-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dca34871e412d6a51ecdc5dfa6de65ed
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d30957246096b94779d9d6ee8a954358
publicationDate 2021-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-202143359-A
titleOfInvention Plasma etching device and its working method
abstract The invention relates to a plasma etching device and a working method thereof. The plasma etching device includes a reaction chamber, an upper electrode element, a cooling device, a first driving device, and a heating device; the reaction chamber has a base on which the substrate to be processed is placed; the upper electrode element is located on the top of the reaction chamber and is opposite to the base set up. The cooling device is arranged on the upper electrode element; the first driving device is connected with the cooling device and is used to drive the cooling device to leave or contact the upper electrode element; the heating device is arranged on the upper electrode element and is used to heat the upper electrode element.
priorityDate 2019-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 21.