http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202143359-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4fe6aaea44d7b3cb0ace2b6c69a1c383 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32522 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32431 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
filingDate | 2020-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dca34871e412d6a51ecdc5dfa6de65ed http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d30957246096b94779d9d6ee8a954358 |
publicationDate | 2021-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-202143359-A |
titleOfInvention | Plasma etching device and its working method |
abstract | The invention relates to a plasma etching device and a working method thereof. The plasma etching device includes a reaction chamber, an upper electrode element, a cooling device, a first driving device, and a heating device; the reaction chamber has a base on which the substrate to be processed is placed; the upper electrode element is located on the top of the reaction chamber and is opposite to the base set up. The cooling device is arranged on the upper electrode element; the first driving device is connected with the cooling device and is used to drive the cooling device to leave or contact the upper electrode element; the heating device is arranged on the upper electrode element and is used to heat the upper electrode element. |
priorityDate | 2019-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.