| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f4a8faea375370b67c9d71e67db32bcd |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-90
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2006-90
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01P2002-60 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01F17-218
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-083
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32477
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32495
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-87
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-5045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-02 |
| filingDate |
2020-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_63b1be7d00ddf2aaf849b97e8658ac23
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cfffa055ff5394c37a75bfb16625b083
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c77e5313447231d6862daf9f5f4802a1 |
| publicationDate |
2021-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-202140836-A |
| titleOfInvention |
Components for plasma processing device and plasma processing device |
| abstract |
The present invention provides a component for a plasma processing device and a plasma processing device with excellent plasma resistance and high durability. The member for a plasma processing apparatus of the present invention includes: a substrate 2 containing a first element as a metallic element or a semi-metal element; and a film 3 on the substrate and containing yttrium oxide as a main component; and the film 3 The area ratio of crystal grains of yttrium oxide aligned within ±10° of the {111} direction offset from the lattice plane of yttrium oxide is 45% or more. |
| priorityDate |
2019-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |