| abstract |
Si-containing film forming compositions are disclosed comprising a precursor having the formula [-NR-R4R5Si-(CH2)t-SiR2R3-]n wherein n = 2 to 400; R, R2, R3, R4, and R5 are independently H, a hydrocarbon group, or an alkylamino group, and provided that at least one of R2, R3, R4, and R5 is H; and R is independently H, a hydrocarbon group, or a silyl group. Exemplary precursors include, but are not limited to, [-NH-SiH2-CH2-SiH2-]n, and [-N(SiH2-CH2-SiH3)-SiH2-CH2-SiH2-]n. |