| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ea00816377f5ef10b2245e7c1eaa8bea |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-2288
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F17-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F19-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-5346
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-91
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-452
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-407
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-2224 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-22 |
| filingDate |
2020-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4150600bc124ce558248c85f304ac77c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b7c6913ec8a01b268a2f6b31afe982e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_65fdc8b479f0aad18036742b588af4f5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b9a9a42b1029a9a98233bdf3cece3f7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_42bd8b300ddf2951b806789176d1adf8 |
| publicationDate |
2021-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-202115096-A |
| titleOfInvention |
Organometallic compounds for the deposition of high purity tin oxide and dry etching of the tin oxide films and deposition reactors |
| abstract |
Specific organometallic compounds of Formula I: Qx-Sn-(A1R1'z)4-x or Formula II: Sn(NR2(CH2)nA2)2 useful for the deposition of high purity tin oxide, as well as methods of using such compounds are disclosed. Also disclosed are compositions of organometallic compounds useful for the deposition of high purity tin oxide that in combination improve stability. Also disclosed are processes for dry etching tin oxide with a particular etchant gas and/or a process for dry etching a substrate using a particular etchant gas with a specific additive. |
| priorityDate |
2019-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |