| abstract |
The present invention provides a treatment solution and a treatment method for etching a first metal-containing material containing one or more first metals selected from the group consisting of Co and Cu while having excellent removability for removing target objects. The processing liquid of the present invention is a processing liquid used when processing a first metal-containing substance containing one or more first metals selected from the group consisting of Co and Cu, and the processing liquid contains etching The content of the organic solvent is 80% by mass or more relative to the total mass of the aforementioned treatment liquid, and the preservative is selected from one or more of the group consisting of compound X, compound Y, and compound Z Compound. |