http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202109705-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bb1bec90258b94e7826cc6a2f92437bd |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67248 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B5-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67034 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate | 2020-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bcb8d09a305b2475d41f548298094ee8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8987cb9cf281a31135115dc3f952386f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e93b0e312809ec8e1713d18ab68ffe50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20a305b2af97df7036e7d40cda26c103 |
| publicationDate | 2021-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-202109705-A |
| titleOfInvention | Dry cleaning apparatus using plasma and steam |
| abstract | Provided is a dry cleaning apparatus using plasma and steam. The apparatus includes a chamber which has an upper supply port formed in an upper surface portion thereof, a discharge port formed in a lower surface portion thereof, and a side supply port formed in a side surface portion and provides a cleaning space, a chuck which is coupled to the lower surface portion of the chamber and on which a single crystalline silicon substrate, on which amorphous silicon, polycrystalline silicon, silicon oxide, or silicon nitride is formed, is placed, a radio-frequency (RF) electrode which is coupled to the upper surface portion of the chamber and to which RF power is applied, an upper shower head which is coupled to the RF electrode to communicate with the upper supply port formed in the upper surface portion of the chamber and in which a plurality of upper spray holes are formed, a lower shower head which is coupled to the side surface portion of the chamber, in which a plurality of first lower spray holes and a plurality of second lower spray holes which communicate with the side supply port are formed, and which is electrically grounded, a reaction gas supply unit configured to supply reaction gas through the upper supply port formed in the upper surface portion of the chamber, and a steam supply unit configured to supply high-temperature steam through the side supply port formed in the side surface portion of the chamber. |
| priorityDate | 2019-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 45.