http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202044401-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_466735dc34bd31cf0d251830c13a51c6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6813f68bbadbcaae3828aa035190fede
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0332
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32651
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-033
filingDate 2019-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7db84d23debe5bf77d144ece0f076633
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_efb2aa8c6f711619def3fa3ca56399bb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a44af179def541799d8b9f50aece6614
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_692b9e722472dee28750cff5aaee7b30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a802d4635cf69108651b3e0d8ed6aa1d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3f7c617f51cade8d01eb79f8b02d9b01
publicationDate 2020-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-202044401-A
titleOfInvention Carbon containing hardmask removal process using sulfur containing process gas
abstract Apparatus, systems, and methods for conducting a hardmask (e.g., carbon containing hardmask) removal process on a workpiece are provided. In one example implementation, a process can include admitting a process gas into a plasma chamber, generating a plasma in the plasma chamber from the process gas using an inductively coupled plasma source, and exposing the carbon containing hardmask to the plasma to remove at least a portion of the carbon containing hardmask. The process gas can include a sulfur containing gas. The process gas does not include a halogen containing gas. The inductively coupled plasma source can be separated from the plasma chamber by a grounded electrostatic shield to reduce capacitive coupling between the inductively coupled plasma source and the plasma.
priorityDate 2018-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457698762
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24823
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID281
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559526
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23935
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419548083
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID945
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419569943
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6325
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559537
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556968
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID784
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559535
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458393697
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6334
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458357694
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10039
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577374
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23968
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457765275
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419569950
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID455728551
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458427267
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419546958
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID402
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559542
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23987
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID297
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6324
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559478
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457778337
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559581
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23991
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419546360
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID280
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID1119
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24682

Total number of triples: 68.