| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ec83ea8e6721b1a5654b038fdb9b223f |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67161
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67034
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6704
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6708
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6719
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67155
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2020-02-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f553114c22c6a5b58d5bef962bf2dca1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b54866b2315e78c40b32f729c654af8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f72959f043bc31549d010bc66b13660 |
| publicationDate |
2020-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-202040670-A |
| titleOfInvention |
Substrate processing method, semiconductor producing method, and substrate processing apparatus |
| abstract |
By a substrate processing method, a substrate (W) having a pattern (PT) including a plurality of structures (63) is processed. The substrate processing method includes: a step (S1) of executing specific processing using a non-liquid on the structures (63) for increasing hydrophilicity of a surface (62) of each structure (63) as compared to that before execution of the specific processing; and a step (S3) of supplying a process liquid to the structures (63) after the step (S1) for increasing the hydrophilicity. |
| priorityDate |
2019-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |