| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_421cadb30fc0074fe61126eb980d19d6 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3341 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0337
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32174
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32926 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2020-02-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_54da44db697352681932a12c04432018
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a8adbe360c0d40b0898258379e5fa32b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7139316adfd7ea92c7b7c43fbb268331
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f67da1d1acda15c869b1c557111f9374 |
| publicationDate |
2020-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-202030798-A |
| titleOfInvention |
Plasma processing method and plasma processing device |
| abstract |
The present invention relates to a plasma processing method for plasma etching an etched film formed on a sample, which has:nThe protective film formation process is to selectively form a protective film on the upper part of the pattern formed on the sample, adjust the width of the formed protective film, and enable the distribution of the width of the formed protective film within the surface of the sample Become the desired distribution; andnAfter the protective film formation process, the process of plasma etching the etched film. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I809602-B |
| priorityDate |
2019-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |