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publicationDate 2020-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-202029411-A
titleOfInvention Methods of thinning silicon on epoxy mold compound for radio frequency (rf) applications
abstract Embodiments of methods for processing a semiconductor substrate are described herein. In some embodiments, a method of processing a semiconductor substrate includes removing material from a backside of a reconstituted substrate having a plurality of dies to expose at least one die of the plurality of dies; etching the backside of the reconstituted substrate to remove material from the exposed at least one die; and depositing a first layer of material on the backside of the reconstituted substrate and the exposed at least one die.
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