http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-202008459-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_421cadb30fc0074fe61126eb980d19d6 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32311 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32834 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32513 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32238 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate | 2019-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e47e78a56f77bc18e4666af65d397ee0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_322898ace294c41893dc08034f08bff7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3bdb62cb1de1031c80e87dfe0a910301 |
| publicationDate | 2020-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-202008459-A |
| titleOfInvention | Plasma treatment device |
| abstract | In the plasma processing apparatus, in order to reduce the damage caused by the deterioration of the sealing member under the condition that the structure of the vacuum sealing portion of the vacuum container does not become a complicated shape, clean without affecting the life of the sealing member The plasma processing apparatus includes: a processing chamber; a vacuum exhaust portion that evacuates the interior of the processing chamber; a gas supply portion that supplies gas to the interior of the processing chamber; and is disposed inside the processing chamber for loading A sample table for placing a sample to be processed; and a window portion above the sample table that constitutes the patio surface of the processing chamber; a high-frequency power supply portion that supplies high-frequency power to the interior of the processing chamber; its characteristics are: the window portion It is connected to the processing chamber with a sealing member of an elastic system sandwiched therebetween. In the state where the interior of the processing chamber has been evacuated by a vacuum evacuation section, the window and processing The space between the chambers is provided with a sealing member at a position where the ratio of the distance from the inner wall surface of the processing chamber to the sealing member becomes 3 or more. |
| priorityDate | 2018-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.