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filingDate 2019-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2020-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-202004902-A
titleOfInvention Substrate processing method and substrate processing apparatus
abstract An etching shape can be suppressed from having non-uniform pattern. A substrate processing method includes burying an organic film in a recess surrounded by a silicon-containing film formed on a sidewall of a pattern of photoresist on a target film; and etching or sputtering the organic film and the silicon-containing film under a condition in which a selectivity thereof is about 1:1.
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