http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201929034-A

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filingDate 2018-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa28e78b33bd799173e22d9ed5f87951
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publicationDate 2019-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201929034-A
titleOfInvention Plasma processing device and method thereof
abstract This case proposes a plasma processing device and method. In an exemplary implementation, the plasma processing apparatus includes a processing chamber. The plasma processing apparatus includes a bracket placed in the processing chamber. The bracket is operable to support a workpiece. The plasma processing apparatus includes a plasma chamber disposed vertically above the processing chamber. The plasma chamber includes a dielectric sidewall. The plasma processing apparatus includes a separation grid that separates a processing chamber from a plasma chamber. The plasma processing apparatus includes a first plasma source adjacent to the dielectric sidewall. The first plasma source is operable to generate a remote plasma above a separation grid in the plasma chamber. The plasma processing apparatus includes a second plasma source. The second plasma source is operable to generate a direct plasma below the separation grid in the plasma chamber.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111120235-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111120235-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I772862-B
priorityDate 2017-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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