| abstract |
The invention provides a plasma reactor having a low frequency RF power distribution adjusting function, comprising: a reaction chamber having a conductive base therein, the conductive base being connected to a low frequency RF power source by a first matching device, and conducting The base includes an electrostatic chuck, the upper surface of the electrostatic chuck is used to fix the substrate to be processed, and the outer sidewall of the conductive base is coated with at least one layer of insulating material resistant to plasma corrosion, and a coupling ring made of insulating material surrounds Around the periphery of the susceptor, a focus ring is disposed above the coupling ring, the focus ring surrounds the electrostatic chuck and is exposed to the plasma during plasma processing, and a ring electrode is disposed at the coupling ring Below the upper and focus ring, a first end of a wire is electrically connected to the base, a second end is connected to the ring electrode, and a variable capacitor is connected in series to the wire. |