| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67069 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32477
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02527
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-505
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32009
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32165
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4557
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32091 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-42 |
| filingDate |
2018-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf014b8845cbb7480df904347f952588
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4fd676c2d4087aa1b052522016219727
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e03dd780d43ff0bd8102e765041e7a40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_53914d1e2a372abb6658252d66228274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1c60e3d91b9133bad5d1ccaa3aa80ce |
| publicationDate |
2018-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201840248-A |
| titleOfInvention |
Plasma processing method and plasma processing device |
| abstract |
The present invention aims to suppress the generation of particles from a protective film for a member inside a protective chamber. A plasma processing method includes: a first film forming step, which uses a carbon-containing gas plasma to form a carbon film on the surface of a component inside the chamber; a second film forming step, which uses The silicon-containing gas is used to form a silicon-containing film on the surface of the carbon-containing film in accordance with the thickness of the carbon-containing film. The plasma treatment step is performed after the silicon-containing film is formed by processing the gas. Plasma plasma treatment of the object to be carried inside the chamber; the first removal step is to remove the object to be plasma treated to the outside of the chamber, and then use fluorine-containing The plasma of the gas removes the silicon-containing film from the surface of the carbon-containing film; and the second removing step removes the carbon-containing film from the surface of the component by the plasma of the oxygen-containing gas. |
| priorityDate |
2017-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |