http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201726951-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32119
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3178
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32504
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32642
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32477
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32495
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-221
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
filingDate 2016-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6700654df0f17e209be2ab02283299f1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44beb4e9bb8320caa3e0e6985c7dfe19
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c65495ebe3558852b2f26574f4cc3c8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_65fd983793de83404fb384d54a27a25f
publicationDate 2017-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201726951-A
titleOfInvention Plasma etching device with plasma-resistant coating
abstract The present disclosure provides an apparatus for use in a plasma processing chamber. The apparatus comprises a component body and a coating layer having a thickness of no more than 30 micrometers, substantially consisting of an oxyfluoride in which a lanthanide element, or a group III element, or a group IV element is added, and covering the body of the component surface.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I737933-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112053929-A
priorityDate 2015-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577485
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID452894838
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426015070
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID161825819
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID57348103
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23992
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577452
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23995
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID454089472
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577454
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23986
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559021
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577457
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23926
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23982
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449744005
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID4092293
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23993
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23912
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458437476
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577474

Total number of triples: 56.