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filingDate 2015-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_92984aa0d50b82cfb39239e43f418d7f
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publicationDate 2016-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201638675-A
titleOfInvention Negative photosensitive polyoxane composition
abstract The present invention relates to a negative photosensitive polyoxoxane composition comprising: (A) 5 to 25 weight percent of a polyoxyalkylene compound; (B) 0.1 to 20 weight percent of a phthalate oligomer; (C) 1 to 15% by weight of the polyfunctional dioxane compound; (D) 0.1 to 10% by weight of the photopolymerization initiator; and (E) the balance solvent. The negative-type photosensitive polyoxane composition provided by the present invention has excellent characteristics such as high surface hardness, high moisture resistance, and good reliability under low-temperature solid baking.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I719388-B
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