| abstract |
An object of the present invention is to improve the controllability, film quality, and the like of the composition of a nitride film formed on a substrate.nThe present invention has the steps of: supplying a first raw material and a first nitriding agent to a substrate having an oxygen-containing film formed on the surface thereof, and forming an initial film on the oxygen-containing film; and initializing the initial film plasma by nitriding The film is modified into a first nitride film; and a second material and a second nitriding agent are supplied to the substrate, and a second nitride film is formed on the first nitride film. |