| abstract |
An object of the present invention is to provide a radical gas generating system which can be uniformly treated by a radical gas even in a large-area processed body, for example, in a remote plasma film forming processing system. In contrast, in the radical gas generating system (500) of the present invention, the processing chamber device (200) has a table (201) for rotating the object to be processed (202). The radical gas generating device (100) has a plurality of discharge cells (70). Further, the discharge unit (70) has an opening (102) that is connected to the inside of the processing chamber device (200) and faces the object to be processed (202) to output a radical gas (G2). Further, in a plan view, the discharge unit (70) disposed farther from the center of the rotation, the region where the first electrode member (1) and the second electrode member (31) face each other, that is, the facing area Increase. |