| abstract |
The present invention provides metal corrosion inhibiting cleaning compositions, methods and systems for copper (Cu), tungsten (W), titanium (Ti), tantalum (Ta), cobalt (Co), and aluminum (Al). The metal corrosion inhibiting cleaning compositions provide a corrosion inhibiting effect by using a combination of two chemicals - at least one polyfunctional amine having more than one amine group and at least one polyfunctional acid having more than one carboxyl group - . The metal corrosion inhibiting cleaning compositions are effective in cleaning residues derived from high density plasma etching followed by oxygenated plasma ashing; and slurry particles and residues remaining after chemical mechanical polishing (CMP). |