| abstract |
A method is provided for depositing a nanolayered protective layer on the core layer, while allowing a high quality conformal film to be deposited on the core layer for use in advanced multiple patterning schemes. In several embodiments, the methods include depositing a thin tantalum oxide or titanium oxide film using a plasma-based atomic layer deposition technique with low high frequency radio frequency (HFRF) plasma power, followed by high HFRF plasma power Depositing a conformal titanium oxide film or spacer. |